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Interpretation of TOF-SIMS depth profiles from ultrashallow high-k dielectric stacks assisted by hybrid collisional computer simulation
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Interpretation of TOF-SIMS depth profiles from ultrashallow high-k dielectric stacks assisted by hybrid collisional computer simulation
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Date
2005
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Ignatova, V.A.
;
Möller, W.
;
Conard, Thierry
;
Vandervorst, Wilfried
;
Gijbels, R.
Journal
Applied Physics A
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Views
1843
since deposited on 2021-10-16
1
last month
1
last week
Acq. date: 2026-08-10
Citations