Publication:
Interpretation of TOF-SIMS depth profiles from ultrashallow high-k dielectric stacks assisted by hybrid collisional computer simulation
Date
| dc.contributor.author | Ignatova, V.A. | |
| dc.contributor.author | Möller, W. | |
| dc.contributor.author | Conard, Thierry | |
| dc.contributor.author | Vandervorst, Wilfried | |
| dc.contributor.author | Gijbels, R. | |
| dc.contributor.imecauthor | Conard, Thierry | |
| dc.contributor.imecauthor | Vandervorst, Wilfried | |
| dc.contributor.orcidimec | Conard, Thierry::0000-0002-4298-5851 | |
| dc.date.accessioned | 2021-10-16T02:15:35Z | |
| dc.date.available | 2021-10-16T02:15:35Z | |
| dc.date.issued | 2005-02 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/10632 | |
| dc.source.beginpage | 71 | |
| dc.source.endpage | 77 | |
| dc.source.issue | 1 | |
| dc.source.journal | Applied Physics A | |
| dc.source.volume | 81 | |
| dc.title | Interpretation of TOF-SIMS depth profiles from ultrashallow high-k dielectric stacks assisted by hybrid collisional computer simulation | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
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