Publication:
45nm LSTP FET with FUSI gate on PVD-HfO2 with excellent drivability by advanced PDA treatment
Date
Loading...
Journal
Abstract
Description
Metrics
Views
2003 since deposited on 2021-10-16
Acq. date: 2025-10-23
Citations
Metrics
Views
2003 since deposited on 2021-10-16
Acq. date: 2025-10-23
Citations