Publication:

Middle-of-line plasma dry etch challenges for Buried Power Rail integration

Date

2022
Proceedings Paper
https://doi.org/10.1117/12.2616731
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dc.contributor.authorRadisic, Dunja
dc.contributor.authorVeloso, Anabela
dc.contributor.authorGupta, Anshul
dc.contributor.authorHosseini, Maryam
dc.contributor.authorWang, Shouhua
dc.contributor.authorMertens, Hans
dc.contributor.authorChan, BT
dc.contributor.authorBatuk, Dmitry
dc.contributor.authorMartinez Alanis, Gerardo Tadeo
dc.contributor.authorLazzarino, Frederic
dc.contributor.authorDentoni Litta, Eugenio
dc.contributor.authorHoriguchi, Naoto
dc.contributor.imecauthorRadisic, Dunja
dc.contributor.imecauthorVeloso, Anabela
dc.contributor.imecauthorGupta, Anshul
dc.contributor.imecauthorHosseini, Maryam
dc.contributor.imecauthorWang, Shouhua
dc.contributor.imecauthorMertens, Hans
dc.contributor.imecauthorChan, BT
dc.contributor.imecauthorBatuk, Dmitry
dc.contributor.imecauthorMartinez Alanis, Gerardo Tadeo
dc.contributor.imecauthorLazzarino, Frederic
dc.contributor.imecauthorDentoni Litta, Eugenio
dc.contributor.imecauthorHoriguchi, Naoto
dc.contributor.orcidimecHosseini, Maryam::0000-0002-0210-4095
dc.contributor.orcidimecChan, BT::0000-0003-2890-0388
dc.contributor.orcidimecBatuk, Dmitry::0000-0002-6384-6690
dc.contributor.orcidimecMartinez Alanis, Gerardo Tadeo::0000-0001-5036-0491
dc.contributor.orcidimecLazzarino, Frederic::0000-0001-7961-9727
dc.contributor.orcidimecDentoni Litta, Eugenio::0000-0003-0333-376X
dc.contributor.orcidimecHoriguchi, Naoto::0000-0001-5490-0416
dc.contributor.orcidimecRadisic, Dunja::0009-0006-4655-5417
dc.contributor.orcidimecGupta, Anshul::0000-0003-4276-5397
dc.contributor.orcidimecWang, Shouhua::0000-0002-9105-8552
dc.contributor.orcidimecMertens, Hans::0000-0002-3392-6892
dc.date.accessioned2022-11-29T11:32:23Z
dc.date.available2022-09-08T02:38:38Z
dc.date.available2022-11-29T11:32:23Z
dc.date.issued2022
dc.identifier.doi10.1117/12.2616731
dc.identifier.eisbn978-1-5106-4988-0
dc.identifier.isbn978-1-5106-4987-3
dc.identifier.issn0277-786X
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/40367
dc.publisherSPIE-INT SOC OPTICAL ENGINEERING
dc.source.beginpage120560C
dc.source.conferenceConference on Advanced Etch Technology and Process Integration for Nanopatterning XI Part of SPIE Advanced Lithography and Patterning Conference
dc.source.conferencedateAPR 24-MAY 27, 2020-2022
dc.source.conferencelocationSan Jose, CA, USA
dc.source.journalProceedings of SPIE
dc.source.numberofpages8
dc.source.volume12056
dc.title

Middle-of-line plasma dry etch challenges for Buried Power Rail integration

dc.typeProceedings paper
dspace.entity.typePublication
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