Publication:

Functional water solutions to enable advanced wet cleaning process for next generation semiconductor device manufacturing

Date

2021
Meeting abstract
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dc.contributor.authorIino, Hideaki
dc.contributor.authorTanaka, Yoichi
dc.contributor.authorGan, Nobuko
dc.contributor.authorFukui, Takeo
dc.contributor.authorAkanishi, Yuya
dc.contributor.authorIwahata, Shota
dc.contributor.authorOniki, Yusuke
dc.contributor.authorAltamirano Sanchez, Efrain
dc.contributor.authorHolsteyns, Frank
dc.contributor.imecauthorTanaka, Yoichi
dc.contributor.imecauthorAkanishi, Yuya
dc.contributor.imecauthorIwahata, Shota
dc.contributor.imecauthorOniki, Yusuke
dc.contributor.imecauthorAltamirano Sanchez, Efrain
dc.contributor.imecauthorHolsteyns, Frank
dc.contributor.orcidimecOniki, Yusuke::0000-0002-6619-1327
dc.date.accessioned2022-04-29T08:01:26Z
dc.date.available2021-12-01T15:41:31Z
dc.date.available2022-04-29T08:01:26Z
dc.date.issued2021
dc.identifier.issnn/a
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/38513
dc.source.conferenceUltrapure Micro 2021 Annual Conference
dc.source.conferencedate3-5 November 2021
dc.source.conferencelocationVirtual
dc.source.journaln/a
dc.source.numberofpages2
dc.title

Functional water solutions to enable advanced wet cleaning process for next generation semiconductor device manufacturing

dc.typeMeeting abstract
dspace.entity.typePublication
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