Publication:

EUV DRAM Patterning Historic Overview and Future Assumption

Date

2025
Proceedings Paper
https://doi.org/10.1117/12.3052340
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dc.contributor.authorLee, Jeonghoon
dc.contributor.authorHwang, Soobin
dc.contributor.authorVan Tuong Pham
dc.contributor.authorMiyaguchi, Kenichi
dc.contributor.authorNiroomand, Ardavan
dc.contributor.authorVerstraete, Lander
dc.contributor.authorYang, Kiho
dc.contributor.authorGillijns, Werner
dc.contributor.authorDas, Shubhankar
dc.contributor.authorBlanco, Victor
dc.contributor.authorHalder, Sandip
dc.contributor.authorSuh, Hyo Seon
dc.contributor.authorSherazi, Yasser
dc.contributor.authorTrivkovic, Darko
dc.contributor.authorVanelderen, Pieter
dc.contributor.authorLee, Inhee
dc.contributor.authorRonse, Kurt
dc.contributor.authorKim, Ryan Ryoung Han
dc.contributor.imecauthorLee, Jeonghoon
dc.contributor.imecauthorHwang, Soobin
dc.contributor.imecauthorVan Tuong Pham
dc.contributor.imecauthorMiyaguchi, Kenichi
dc.contributor.imecauthorNiroomand, Ardavan
dc.contributor.imecauthorVerstraete, Lander
dc.contributor.imecauthorYang, Kiho
dc.contributor.imecauthorGillijns, Werner
dc.contributor.imecauthorDas, Shubhankar
dc.contributor.imecauthorBlanco, Victor
dc.contributor.imecauthorHalder, Sandip
dc.contributor.imecauthorSuh, Hyo Seon
dc.contributor.imecauthorSherazi, Yasser
dc.contributor.imecauthorTrivkovic, Darko
dc.contributor.imecauthorVanelderen, Pieter
dc.contributor.imecauthorLee, Inhee
dc.contributor.imecauthorRonse, Kurt
dc.contributor.imecauthorKim, Ryan Ryoung Han
dc.contributor.orcidimecHwang, Soobin::0009-0009-9504-1852
dc.contributor.orcidimecMiyaguchi, Kenichi::0000-0002-7073-6457
dc.contributor.orcidimecVerstraete, Lander::0000-0002-3679-811X
dc.contributor.orcidimecYang, Kiho::0009-0002-8866-4807
dc.contributor.orcidimecGillijns, Werner::0000-0002-2430-7360
dc.contributor.orcidimecDas, Shubhankar::0000-0003-1830-1226
dc.contributor.orcidimecBlanco, Victor::0000-0003-4308-0381
dc.contributor.orcidimecHalder, Sandip::0000-0002-6314-2685
dc.contributor.orcidimecSuh, Hyo Seon::0000-0003-4370-5062
dc.contributor.orcidimecSherazi, Yasser::0000-0002-4076-8597
dc.contributor.orcidimecTrivkovic, Darko::0009-0003-7858-1802
dc.contributor.orcidimecVanelderen, Pieter::0009-0008-3347-0072
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.contributor.orcidimecKim, Ryan Ryoung han::0009-0002-3327-5169
dc.date.accessioned2025-07-31T03:59:30Z
dc.date.available2025-07-31T03:59:30Z
dc.date.issued2025
dc.identifier.doi10.1117/12.3052340
dc.identifier.eisbn978-1-5106-8637-3
dc.identifier.isbn978-1-5106-8636-6
dc.identifier.issn0277-786X
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/45972
dc.publisherSPIE-INT SOC OPTICAL ENGINEERING
dc.source.conference2025 Conference on DTCO and Computational Patterning
dc.source.conferencedateFEB 25-28, 2025
dc.source.conferencelocationSan Jose
dc.source.numberofpages13
dc.source.volume13425
dc.title

EUV DRAM Patterning Historic Overview and Future Assumption

dc.typeProceedings paper
dspace.entity.typePublication
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