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Ultra thin oxide reliability : effects of gate doping concentration and poly-Si.SiO2 interface stress relaxation
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1920 since deposited on 2021-09-29
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Acq. date: 2025-10-25
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1920 since deposited on 2021-09-29
428item.page.metrics.field.last-week
Acq. date: 2025-10-25
Citations