Nanobeam dffraction: technique evaluation and strain measurement on complementary metal oxide semiconductor devices

dc.contributor.author	Favia, Paola
dc.contributor.author	Bargallo Gonzalez, Mireia
dc.contributor.author	Simoen, Eddy
dc.contributor.author	Verheyen, Peter
dc.contributor.author	Klenov, Dmitri
dc.contributor.author	Bender, Hugo
dc.contributor.imecauthor	Favia, Paola
dc.contributor.imecauthor	Simoen, Eddy
dc.contributor.imecauthor	Verheyen, Peter
dc.contributor.imecauthor	Bender, Hugo
dc.contributor.orcidimec	Favia, Paola::0000-0002-1019-3497
dc.contributor.orcidimec	Simoen, Eddy::0000-0002-5218-4046
dc.date.accessioned	2021-10-19T13:29:48Z
dc.date.available	2021-10-19T13:29:48Z
dc.date.issued	2011
dc.identifier.issn	0013-4651
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/18900
dc.source.beginpage	H438
dc.source.endpage	H446
dc.source.issue	4
dc.source.journal	Journal of the Electrochemical Society
dc.source.volume	158
dc.title	Nanobeam dffraction: technique evaluation and strain measurement on complementary metal oxide semiconductor devices
dc.type	Journal article
dspace.entity.type	Publication
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