Mechanism of copper deposition on silicon from dilute hydrofluoric acid solution

dc.contributor.author	Norga, Gerd
dc.contributor.author	Platero, M.
dc.contributor.author	Black, K. A.
dc.contributor.author	Reddy, A. J.
dc.contributor.author	Michel, J.
dc.contributor.author	Kimerling, L. C.
dc.date.accessioned	2021-09-30T09:21:21Z
dc.date.available	2021-09-30T09:21:21Z
dc.date.embargo	9999-12-31
dc.date.issued	1997
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/2060
dc.source.beginpage	2801
dc.source.endpage	2810
dc.source.issue	8
dc.source.journal	J. Electrochem. Soc.
dc.source.volume	144
dc.title	Mechanism of copper deposition on silicon from dilute hydrofluoric acid solution
dc.type	Journal article
dspace.entity.type	Publication
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