Publication:

Controlled isotropic etches for Gate-All-Around (GAA) device architectures

Date

2020
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dc.contributor.authorMuraki, Yusuke
dc.contributor.authorOniki, Yusuke
dc.contributor.authorKenis, Karine
dc.contributor.authorAltamirano Sanchez, Efrain
dc.contributor.authorHolsteyns, Frank
dc.contributor.authorKal, Subhadeep
dc.contributor.authorAlix, Cheryl
dc.contributor.authorKumar, Kaushik
dc.contributor.authorMosden, Aelan
dc.contributor.imecauthorMuraki, Yusuke
dc.contributor.imecauthorOniki, Yusuke
dc.contributor.imecauthorKenis, Karine
dc.contributor.imecauthorAltamirano Sanchez, Efrain
dc.contributor.imecauthorHolsteyns, Frank
dc.contributor.imecauthorKumar, Kaushik
dc.contributor.orcidimecOniki, Yusuke::0000-0002-6619-1327
dc.date.accessioned2021-10-29T01:11:01Z
dc.date.available2021-10-29T01:11:01Z
dc.date.issued2020
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/35627
dc.identifier.urlhttps://www.linx-consulting.com/wp-content/uploads/2020/08/LINX_SPCC2020_Agenda_R12.pdf
dc.source.conferenceSurface Preparation and Cleaning Conference - SPCC
dc.source.conferencedate1/04/2020
dc.source.conferencelocationonline online
dc.title

Controlled isotropic etches for Gate-All-Around (GAA) device architectures

dc.typeOral presentation
dspace.entity.typePublication
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