Publication:

Metal inserted poly-Si (MIPS) and FUSI dual metal (TaN and NiSi) CMOS integration

Date

2007-04
Proceedings Paper
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dc.contributor.authorSinganamalla, Raghunath
dc.contributor.authorVan Dal, Mark
dc.contributor.authorDemand, Marc
dc.contributor.authorShamiryan, Denis
dc.contributor.authorBeckx, Stephan
dc.contributor.authorJaenen, Patrick
dc.contributor.authorLocorotondo, Sabrina
dc.contributor.authorYu, HongYu
dc.contributor.authorHooker, Jacob
dc.contributor.authorKubicek, Stefan
dc.contributor.authorDe Meyer, Kristin
dc.contributor.authorBiesemans, Serge
dc.contributor.authorJuffermans, Casper
dc.contributor.authorLander, Rob
dc.contributor.imecauthorVan Dal, Mark
dc.contributor.imecauthorDemand, Marc
dc.contributor.imecauthorBeckx, Stephan
dc.contributor.imecauthorJaenen, Patrick
dc.contributor.imecauthorLocorotondo, Sabrina
dc.contributor.imecauthorKubicek, Stefan
dc.contributor.imecauthorDe Meyer, Kristin
dc.contributor.imecauthorBiesemans, Serge
dc.date.accessioned2021-10-16T19:49:12Z
dc.date.available2021-10-16T19:49:12Z
dc.date.issued2007-04
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/12914
dc.source.conferenceInternational Symposium on VLSI Technology, Systems, and Applications - VLSI-TSA
dc.source.conferencedate23/04/2007
dc.source.conferencelocationHsinchu Taiwan
dc.title

Metal inserted poly-Si (MIPS) and FUSI dual metal (TaN and NiSi) CMOS integration

dc.typeProceedings paper
dspace.entity.typePublication
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