Publication:

Insights into the C distribution in Si:C/Si:C:P and the annealing behavior of Si:C layers

Date

2019
Journal article
https://doi.org/10.1149/2.0181903jss
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dc.contributor.authorDhayalan, Sathish Kumar
dc.contributor.authorNuytten, Thomas
dc.contributor.authorPourtois, Geoffrey
dc.contributor.authorSimoen, Eddy
dc.contributor.authorPezzoli, Fabio
dc.contributor.authorBonera, Emiliano
dc.contributor.authorLoo, Roger
dc.contributor.authorRosseel, Erik
dc.contributor.authorHikavyy, Andriy
dc.contributor.authorShimura, Yosuke
dc.contributor.authorVandervorst, Wilfried
dc.contributor.imecauthorNuytten, Thomas
dc.contributor.imecauthorPourtois, Geoffrey
dc.contributor.imecauthorSimoen, Eddy
dc.contributor.imecauthorLoo, Roger
dc.contributor.imecauthorRosseel, Erik
dc.contributor.imecauthorHikavyy, Andriy
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.orcidimecNuytten, Thomas::0000-0002-5921-6928
dc.contributor.orcidimecPourtois, Geoffrey::0000-0003-2597-8534
dc.contributor.orcidimecSimoen, Eddy::0000-0002-5218-4046
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.contributor.orcidimecHikavyy, Andriy::0000-0002-8201-075X
dc.date.accessioned2021-10-27T08:49:20Z
dc.date.available2021-10-27T08:49:20Z
dc.date.embargo9999-12-31
dc.date.issued2019
dc.identifier.doi10.1149/2.0181903jss
dc.identifier.issn2162-8769
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/32890
dc.source.beginpageP209
dc.source.endpageP216
dc.source.issue4
dc.source.journalECS Journal of Solid State Science and Technology
dc.source.volume8
dc.title

Insights into the C distribution in Si:C/Si:C:P and the annealing behavior of Si:C layers

dc.typeJournal article
dspace.entity.typePublication
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