Publication:

Evolution of Secondary Electrons Emission During EUV Exposure in Photoresists

Date

2021
Journal article
https://doi.org/10.2494/photopolymer.34.99
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dc.contributor.authorFallica, Roberto
dc.contributor.authorNannarone, Stefano
dc.contributor.authorMahne, Nicola
dc.contributor.authorMalvezzi, Andrea Marco
dc.contributor.authorBerti, Andrea
dc.contributor.authorDe Simone, Danilo
dc.contributor.imecauthorFallica, Roberto
dc.contributor.imecauthorDe Simone, Danilo
dc.contributor.orcidimecFallica, Roberto::0000-0003-4523-9624
dc.contributor.orcidimecDe Simone, Danilo::0000-0003-3927-5207
dc.date.accessioned2023-08-04T08:29:26Z
dc.date.available2023-06-20T10:35:42Z
dc.date.available2023-06-22T08:19:48Z
dc.date.available2023-08-04T08:29:26Z
dc.date.embargo9999-12-31
dc.date.issued2021
dc.identifier.doihttps://doi.org/10.2494/photopolymer.34.99
dc.identifier.issn0914-9244
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/41901
dc.publisherTECHNICAL ASSOC PHOTOPOLYMERS,JAPAN
dc.source.beginpage99
dc.source.endpage103
dc.source.issue1
dc.source.journalJOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY
dc.source.numberofpages5
dc.source.volume34
dc.title

Evolution of Secondary Electrons Emission During EUV Exposure in Photoresists

dc.typeJournal article
dspace.entity.typePublication
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