Publication:

Forksheet FETs for Advanced CMOS Scaling: Forksheet-Nanosheet Co-Integration and Dual Work Function Metal Gates at 17nm N-P Space

Date

2021
Proceedings Paper
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dc.contributor.authorMertens, Hans
dc.contributor.authorRitzenthaler, Romain
dc.contributor.authorOniki, Yusuke
dc.contributor.authorBriggs, Basoene
dc.contributor.authorChan, BT
dc.contributor.authorHikavyy, Andriy
dc.contributor.authorHopf, Toby
dc.contributor.authorMannaert, Geert
dc.contributor.authorTao, Zheng
dc.contributor.authorSebaai, Farid
dc.contributor.authorPeter, Antony
dc.contributor.authorVandersmissen, Kevin
dc.contributor.authorDupuy, Emmanuel
dc.contributor.authorRosseel, Erik
dc.contributor.authorBatuk, Dmitry
dc.contributor.authorGeypen, Jef
dc.contributor.authorMartinez Alanis, Gerardo Tadeo
dc.contributor.authorAbigail, Daniel_
dc.contributor.authorGrieten, Eva
dc.contributor.authorD'have, Koen
dc.contributor.imecauthorMertens, Hans
dc.contributor.imecauthorRitzenthaler, Romain
dc.contributor.imecauthorOniki, Yusuke
dc.contributor.imecauthorBriggs, Basoene
dc.contributor.imecauthorChan, BT
dc.contributor.imecauthorHikavyy, Andriy
dc.contributor.imecauthorHopf, Toby
dc.contributor.imecauthorMannaert, Geert
dc.contributor.imecauthorTao, Zheng
dc.contributor.imecauthorSebaai, Farid
dc.contributor.imecauthorPeter, Antony
dc.contributor.imecauthorVandersmissen, Kevin
dc.contributor.imecauthorDupuy, Emmanuel
dc.contributor.imecauthorRosseel, Erik
dc.contributor.imecauthorBatuk, Dmitry
dc.contributor.imecauthorGeypen, Jef
dc.contributor.imecauthorMartinez Alanis, Gerardo Tadeo
dc.contributor.imecauthorAbigail, Daniel_
dc.contributor.imecauthorGrieten, Eva
dc.contributor.imecauthorD'have, Koen
dc.contributor.orcidimecRitzenthaler, Romain::0000-0002-8615-3272
dc.contributor.orcidimecOniki, Yusuke::0000-0002-6619-1327
dc.contributor.orcidimecChan, BT::0000-0003-2890-0388
dc.contributor.orcidimecHikavyy, Andriy::0000-0002-8201-075X
dc.contributor.orcidimecDupuy, Emmanuel::0000-0003-3341-1618
dc.contributor.orcidimecBatuk, Dmitry::0000-0002-6384-6690
dc.contributor.orcidimecMartinez Alanis, Gerardo Tadeo::0000-0001-5036-0491
dc.contributor.orcidimecGrieten, Eva::0000-0001-6328-7633
dc.contributor.orcidimecD'have, Koen::0000-0002-5195-9241
dc.contributor.orcidimecMitard, Jerome::0000-0002-7422-079X
dc.contributor.orcidimecSubramanian, Sujith::0000-0001-8938-9750
dc.contributor.orcidimecRagnarsson, Lars-Ake::0000-0003-1057-8140
dc.contributor.orcidimecHellings, Geert::0000-0002-5376-2119
dc.contributor.orcidimecHoriguchi, Naoto::0000-0001-5490-0416
dc.date.accessioned2021-10-31T09:54:05Z
dc.date.available2021-10-31T09:54:05Z
dc.date.issued2021
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/36975
dc.identifier.urlhttps://ieeexplore.ieee.org/document/9508730
dc.source.conference2021 Symposium on VLSI Technology
dc.source.conferencedate13/06/2021
dc.source.conferencelocationKyoto Japan
dc.title

Forksheet FETs for Advanced CMOS Scaling: Forksheet-Nanosheet Co-Integration and Dual Work Function Metal Gates at 17nm N-P Space

dc.typeProceedings paper
dspace.entity.typePublication
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