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Resolution - line width roughness - sensitivity trade-offs in photoresists for advanced lithography
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Resolution - line width roughness - sensitivity trade-offs in photoresists for advanced lithography
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Date
2008
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17731.pdf
1.18 MB
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Gronheid, Roel
;
Van Steenwinckel, David
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1915
since deposited on 2021-10-17
Acq. date: 2025-12-11
Citations
Metrics
Views
1915
since deposited on 2021-10-17
Acq. date: 2025-12-11
Citations