Publication:

Resolution - line width roughness - sensitivity trade-offs in photoresists for advanced lithography

Date

2008
Presentation
Simple item page Full metadata Statistics
 
dc.contributor.authorGronheid, Roel
dc.contributor.authorVan Steenwinckel, David
dc.contributor.imecauthorGronheid, Roel
dc.date.accessioned2021-10-17T07:27:19Z
dc.date.available2021-10-17T07:27:19Z
dc.date.embargo9999-12-31
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/13820
dc.source.conferenceSemicon Europe 2008
dc.source.conferencedate6/10/2008
dc.source.conferencelocationStuttgart Germany
dc.title

Resolution - line width roughness - sensitivity trade-offs in photoresists for advanced lithography

dc.typeOral presentation
dspace.entity.typePublication
Files

Original bundle

Name:
17731.pdf
Size:
1.18 MB
Format:
Adobe Portable Document Format
Download
Publication available in collections:
Presentations