Publication:

Metrology for implanted Si substrate and dopant loss studies

Date

2009
Meeting abstract
Simple item page Full metadata Statistics
 
cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.orcid0009-0006-4655-5417
cris.virtual.orcid0000-0001-7614-2097
cris.virtual.orcid#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.orcid0000-0002-7503-8922
cris.virtual.orcid0009-0003-1267-5355
cris.virtual.orcid0000-0002-2737-8391
cris.virtualsource.department06210970-9201-4c2c-b588-e59e60ef24ae
cris.virtualsource.department9d0d6dfb-64f8-418f-9030-93da69a0078c
cris.virtualsource.departmentaa278ea5-787e-4cf9-b811-072acf5b1d4d
cris.virtualsource.department9a3d60e7-3e8b-4366-b479-ea599b23d28b
cris.virtualsource.department3303f61f-8f71-4733-bc6e-22f2714a9d67
cris.virtualsource.department9001e047-1419-49a0-b570-77d3b3d796f9
cris.virtualsource.orcid06210970-9201-4c2c-b588-e59e60ef24ae
cris.virtualsource.orcid9d0d6dfb-64f8-418f-9030-93da69a0078c
cris.virtualsource.orcidaa278ea5-787e-4cf9-b811-072acf5b1d4d
cris.virtualsource.orcid9a3d60e7-3e8b-4366-b479-ea599b23d28b
cris.virtualsource.orcid3303f61f-8f71-4733-bc6e-22f2714a9d67
cris.virtualsource.orcid9001e047-1419-49a0-b570-77d3b3d796f9
dc.contributor.authorRadisic, Dunja
dc.contributor.authorShamiryan, Denis
dc.contributor.authorMannaert, Geert
dc.contributor.authorBoullart, Werner
dc.contributor.authorRosseel, Erik
dc.contributor.authorBogdanowicz, Janusz
dc.contributor.authorGoossens, Jozefien
dc.contributor.authorMarrant, Koen
dc.contributor.authorBender, Hugo
dc.contributor.imecauthorRadisic, Dunja
dc.contributor.imecauthorMannaert, Geert
dc.contributor.imecauthorBoullart, Werner
dc.contributor.imecauthorRosseel, Erik
dc.contributor.imecauthorBogdanowicz, Janusz
dc.contributor.imecauthorBender, Hugo
dc.contributor.orcidimecBoullart, Werner::0000-0001-7614-2097
dc.contributor.orcidimecBogdanowicz, Janusz::0000-0002-7503-8922
dc.date.accessioned2021-10-18T02:03:00Z
dc.date.available2021-10-18T02:03:00Z
dc.date.embargo9999-12-31
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/16072
dc.source.beginpage2160
dc.source.conference216th ECS Meeting
dc.source.conferencedate4/10/2009
dc.source.conferencelocationVienna Austria
dc.title

Metrology for implanted Si substrate and dopant loss studies

dc.typeMeeting abstract
dspace.entity.typePublication
Files

Original bundle

Name:
18997.pdf
Size:
147.69 KB
Format:
Adobe Portable Document Format
Download
Publication available in collections:
Conference contributions