Publication:

Quantification of drain extension leakage in a scaled bulk germanium pMOS technology

Date

2009
Journal article
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dc.contributor.authorEneman, Geert
dc.contributor.authorDe Jaeger, Brice
dc.contributor.authorSimoen, Eddy
dc.contributor.authorBrunco, David
dc.contributor.authorHellings, Geert
dc.contributor.authorMitard, Jerome
dc.contributor.authorDe Meyer, Kristin
dc.contributor.authorMeuris, Marc
dc.contributor.authorHeyns, Marc
dc.contributor.imecauthorEneman, Geert
dc.contributor.imecauthorDe Jaeger, Brice
dc.contributor.imecauthorSimoen, Eddy
dc.contributor.imecauthorHellings, Geert
dc.contributor.imecauthorMitard, Jerome
dc.contributor.imecauthorDe Meyer, Kristin
dc.contributor.imecauthorMeuris, Marc
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecEneman, Geert::0000-0002-5849-3384
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dc.contributor.orcidimecSimoen, Eddy::0000-0002-5218-4046
dc.contributor.orcidimecHellings, Geert::0000-0002-5376-2119
dc.contributor.orcidimecMitard, Jerome::0000-0002-7422-079X
dc.contributor.orcidimecMeuris, Marc::0000-0002-9580-6810
dc.date.accessioned2021-10-17T22:06:25Z
dc.date.available2021-10-17T22:06:25Z
dc.date.embargo9999-12-31
dc.date.issued2009
dc.identifier.issn0018-9383
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/15275
dc.source.beginpage3115
dc.source.endpage3122
dc.source.issue12
dc.source.journalIEEE Transactions on Electron Devices
dc.source.volume56
dc.title

Quantification of drain extension leakage in a scaled bulk germanium pMOS technology

dc.typeJournal article
dspace.entity.typePublication
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