Measuring and Analyzing Contact Hole Variations in EUV Lithography

dc.contributor.author	Severi, Joren
dc.contributor.author	Mack, Chris A.
dc.contributor.author	Lorusso, Gian
dc.contributor.author	De Simone, Danilo
dc.contributor.imecauthor	Severi, Joren
dc.contributor.imecauthor	Lorusso, Gian
dc.contributor.imecauthor	De Simone, Danilo
dc.contributor.orcidimec	De Simone, Danilo::0000-0003-3927-5207
dc.date.accessioned	2022-03-11T13:31:45Z
dc.date.available	2022-03-11T13:31:45Z
dc.date.issued	2021
dc.identifier.doi	10.1117/12.2585308
dc.identifier.eisbn	978-1-5106-4052-8
dc.identifier.isbn	978-1-5106-4051-1
dc.identifier.issn	0277-786X
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/39413
dc.publisher	SPIE-INT SOC OPTICAL ENGINEERING
dc.source.beginpage	1160913
dc.source.conference	Conference on Extreme Ultraviolet (EUV) Lithography XII
dc.source.conferencedate	FEB 22-26, 2021
dc.source.conferencelocation	Virtual
dc.source.journal	Proceedings of SPIE
dc.source.numberofpages	8
dc.source.volume	11609
dc.title	Measuring and Analyzing Contact Hole Variations in EUV Lithography
dc.type	Proceedings paper
dspace.entity.type	Publication
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