Publication:
Plasma doping and reduced crystalline damage for conformally doped fin feld effect transistors
Date
| cris.virtual.department | #PLACEHOLDER_PARENT_METADATA_VALUE# | |
| cris.virtual.department | #PLACEHOLDER_PARENT_METADATA_VALUE# | |
| cris.virtual.department | #PLACEHOLDER_PARENT_METADATA_VALUE# | |
| cris.virtual.department | #PLACEHOLDER_PARENT_METADATA_VALUE# | |
| cris.virtual.department | #PLACEHOLDER_PARENT_METADATA_VALUE# | |
| cris.virtual.department | #PLACEHOLDER_PARENT_METADATA_VALUE# | |
| cris.virtual.orcid | 0000-0003-3226-4572 | |
| cris.virtual.orcid | 0000-0001-5490-0416 | |
| cris.virtual.orcid | 0000-0003-3763-2098 | |
| cris.virtual.orcid | 0000-0002-6155-9030 | |
| cris.virtual.orcid | 0000-0002-5849-3384 | |
| cris.virtual.orcid | 0000-0002-8615-3272 | |
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| cris.virtualsource.orcid | 112e9a94-6aa4-4c28-96ec-777b0ea053f5 | |
| dc.contributor.author | Lee, Jae Woo | |
| dc.contributor.author | Sasaki, Yuichiro | |
| dc.contributor.author | Cho, Moon Ju | |
| dc.contributor.author | Boccardi, Guillaume | |
| dc.contributor.author | Ritzenthaler, Romain | |
| dc.contributor.author | Eneman, Geert | |
| dc.contributor.author | Chiarella, Thomas | |
| dc.contributor.author | Brus, Stephan | |
| dc.contributor.author | Horiguchi, Naoto | |
| dc.contributor.author | Groeseneken, Guido | |
| dc.contributor.author | Thean, Aaron | |
| dc.contributor.imecauthor | Boccardi, Guillaume | |
| dc.contributor.imecauthor | Ritzenthaler, Romain | |
| dc.contributor.imecauthor | Eneman, Geert | |
| dc.contributor.imecauthor | Chiarella, Thomas | |
| dc.contributor.imecauthor | Brus, Stephan | |
| dc.contributor.imecauthor | Horiguchi, Naoto | |
| dc.contributor.imecauthor | Groeseneken, Guido | |
| dc.contributor.imecauthor | Thean, Aaron | |
| dc.contributor.orcidimec | Boccardi, Guillaume::0000-0003-3226-4572 | |
| dc.contributor.orcidimec | Ritzenthaler, Romain::0000-0002-8615-3272 | |
| dc.contributor.orcidimec | Eneman, Geert::0000-0002-5849-3384 | |
| dc.contributor.orcidimec | Chiarella, Thomas::0000-0002-6155-9030 | |
| dc.contributor.orcidimec | Horiguchi, Naoto::0000-0001-5490-0416 | |
| dc.date.accessioned | 2021-10-21T09:10:45Z | |
| dc.date.available | 2021-10-21T09:10:45Z | |
| dc.date.embargo | 9999-12-31 | |
| dc.date.issued | 2013 | |
| dc.identifier.issn | 0003-6951 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/22659 | |
| dc.source.beginpage | 223508 | |
| dc.source.issue | 22 | |
| dc.source.journal | Applied Physics Letters | |
| dc.source.volume | 102 | |
| dc.title | Plasma doping and reduced crystalline damage for conformally doped fin feld effect transistors | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
| Files | Original bundle
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| Publication available in collections: |