Publication:

Selective etching of SiGe for removal of dummy layers in fully silicided gate artchitectures

Date

2005
Proceedings Paper
Simple item page Full metadata Statistics
 
dc.contributor.authorSnow, Jim
dc.contributor.authorVos, Rita
dc.contributor.authorKottantharayil, Anil
dc.contributor.authorKraus, Harald
dc.contributor.authorXu, Kaidong
dc.contributor.authorGrinninger, F.
dc.contributor.authorWagner, G.
dc.contributor.authorKovacs, F.
dc.contributor.authorMertens, Paul
dc.contributor.imecauthorVos, Rita
dc.contributor.imecauthorMertens, Paul
dc.date.accessioned2021-10-16T05:18:34Z
dc.date.available2021-10-16T05:18:34Z
dc.date.issued2005
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/11250
dc.source.beginpage207
dc.source.conferenceCleaning Technology in Semiconductor Device Manufacturing IX
dc.source.conferencedate17/10/2005
dc.source.conferencelocationLos Angeles, CA USA
dc.source.endpage213
dc.title

Selective etching of SiGe for removal of dummy layers in fully silicided gate artchitectures

dc.typeProceedings paper
dspace.entity.typePublication
Files
Publication available in collections:
Conference contributions