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Impact of vacuum ultraviolet photons on ultrathin polymethylmethacrylate during plasma etching
Publication:
Impact of vacuum ultraviolet photons on ultrathin polymethylmethacrylate during plasma etching
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Date
2024
Journal article
https://doi.org/10.1116/6.0003541
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Arvind, Shikhar
;
Witting Larsen, Esben
;
Bezard, Philippe
;
Petersen, John
;
De Gendt, Stefan
Journal
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
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31
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676
since deposited on 2024-05-02
Acq. date: 2025-12-15
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Metrics
Downloads
31
since deposited on 2024-05-02
11
last month
1
last week
Acq. date: 2025-12-15
Views
676
since deposited on 2024-05-02
Acq. date: 2025-12-15
Citations