Publication:

Impact of vacuum ultraviolet photons on ultrathin polymethylmethacrylate during plasma etching

Date

2024
Journal article
https://doi.org/10.1116/6.0003541
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dc.contributor.authorArvind, Shikhar
dc.contributor.authorWitting Larsen, Esben
dc.contributor.authorBezard, Philippe
dc.contributor.authorPetersen, John
dc.contributor.authorDe Gendt, Stefan
dc.contributor.imecauthorArvind, Shikhar
dc.contributor.imecauthorBezard, Philippe
dc.contributor.imecauthorPetersen, John
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorWitting Larsen, Esben
dc.contributor.orcidimecArvind, Shikhar::0000-0002-4748-7763
dc.contributor.orcidimecBezard, Philippe::0000-0003-2499-0240
dc.contributor.orcidimecPetersen, John::0000-0003-4815-3770
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.contributor.orcidimecWitting Larsen, Esben::0000-0002-6294-0896
dc.date.accessioned2024-09-19T14:21:46Z
dc.date.available2024-05-02T17:47:54Z
dc.date.available2024-09-19T14:21:46Z
dc.date.embargo2024-03-18
dc.date.issued2024
dc.description.wosFundingTextThe authors acknowledge funding from the imec Industrial Affiliation Program (IIAP). Shikhar Arvind acknowledges funding from KU Leuven for their doctoral studies. The authors would like to thank Shreya Kundu of imec for their help with IBE tool. The authors would also like to thank Materials Characterization and Analysis (MCA) group at imec for their help with AFM and XPS analysis.
dc.identifier.doi10.1116/6.0003541
dc.identifier.issn0734-2101
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/43892
dc.publisherA V S AMER INST PHYSICS
dc.source.beginpageArt. 033009
dc.source.endpageN/A
dc.source.issue3
dc.source.journalJOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
dc.source.numberofpages9
dc.source.volume42
dc.subject.keywords193 NM PHOTORESIST
dc.subject.keywordsEUV LITHOGRAPHY
dc.subject.keywordsION
dc.subject.keywordsPMMA
dc.subject.keywordsSURFACE
dc.subject.keywordsARGON
dc.subject.keywordsPOLY(METHYLMETHACRYLATE)
dc.subject.keywordsRADIATION
dc.subject.keywordsFILMS
dc.subject.keywordsVUV
dc.title

Impact of vacuum ultraviolet photons on ultrathin polymethylmethacrylate during plasma etching

dc.typeJournal article
dspace.entity.typePublication
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