Analysis and modeling of the high vacuum scanning spreading resistance microscopy nanocontact on silicon

dc.contributor.author	Eyben, Pierre
dc.contributor.author	Clemente, Francesca
dc.contributor.author	Vanstreels, Kris
dc.contributor.author	Pourtois, Geoffrey
dc.contributor.author	Sankaran, Kiroubanand
dc.contributor.author	Clarysse, Trudo
dc.contributor.author	Mody, Jay
dc.contributor.author	Duriau, Edouard
dc.contributor.author	Hantschel, Thomas
dc.contributor.author	Vandervorst, Wilfried
dc.contributor.author	Mylvaganam, Kausala
dc.contributor.author	Zhang, Liangchi
dc.contributor.imecauthor	Eyben, Pierre
dc.contributor.imecauthor	Vanstreels, Kris
dc.contributor.imecauthor	Pourtois, Geoffrey
dc.contributor.imecauthor	Sankaran, Kiroubanand
dc.contributor.imecauthor	Hantschel, Thomas
dc.contributor.imecauthor	Vandervorst, Wilfried
dc.contributor.orcidimec	Vanstreels, Kris::0000-0002-4420-0966
dc.contributor.orcidimec	Pourtois, Geoffrey::0000-0003-2597-8534
dc.contributor.orcidimec	Sankaran, Kiroubanand::0000-0001-6988-7269
dc.contributor.orcidimec	Hantschel, Thomas::0000-0001-9476-4084
dc.date.accessioned	2021-10-18T16:18:25Z
dc.date.available	2021-10-18T16:18:25Z
dc.date.issued	2010
dc.identifier.issn	1071-1023
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/17091
dc.source.beginpage	401
dc.source.endpage	406
dc.source.issue	2
dc.source.journal	Journal of Vacuum Science and Technology B
dc.source.volume	28
dc.title	Analysis and modeling of the high vacuum scanning spreading resistance microscopy nanocontact on silicon
dc.type	Journal article
dspace.entity.type	Publication
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