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Area-selective atomic layer deposition of TiN, TiO2, and HfO2 for advanced thin film patterning by delayed nucleation on plasma-treated amorphous carbon
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2002 since deposited on 2021-10-26
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Acq. date: 2025-12-16
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2002 since deposited on 2021-10-26
4last month
4last week
Acq. date: 2025-12-16
Citations