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Area-selective atomic layer deposition of TiN, TiO2, and HfO2 for advanced thin film patterning by delayed nucleation on plasma-treated amorphous carbon
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2003 since deposited on 2021-10-26
5last month
Acq. date: 2026-01-08
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Metrics
Views
2003 since deposited on 2021-10-26
5last month
Acq. date: 2026-01-08
Citations