Publication:
Area-selective atomic layer deposition of TiN, TiO2, and HfO2 for advanced thin film patterning by delayed nucleation on plasma-treated amorphous carbon
Date
Loading...
Journal
Abstract
Description
Metrics
Views
1996 since deposited on 2021-10-26
Acq. date: 2025-10-29
Citations
Metrics
Views
1996 since deposited on 2021-10-26
Acq. date: 2025-10-29
Citations