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Highly scalable effective work function engineering approach for multi-VT modulation of planar and FinFET-based RMG high-k last devies for (sub-)22nm nodes

Date

2013
Proceedings Paper
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dc.contributor.authorVeloso, Anabela
dc.contributor.authorBoccardi, Guillaume
dc.contributor.authorRagnarsson, Lars-Ake
dc.contributor.authorHiguchi, Yuichi
dc.contributor.authorLee, Jae Won
dc.contributor.authorSimoen, Eddy
dc.contributor.authorRoussel, Philippe
dc.contributor.authorCho, Moon Ju
dc.contributor.authorChew, Soon Aik
dc.contributor.authorSchram, Tom
dc.contributor.authorDekkers, Harold
dc.contributor.authorVan Ammel, Annemie
dc.contributor.authorWitters, Thomas
dc.contributor.authorBrus, Stephan
dc.contributor.authorDangol, Anish
dc.contributor.authorParaschiv, Vasile
dc.contributor.authorVecchio, Emma
dc.contributor.authorShi, Xiaoping
dc.contributor.authorSebaai, Farid
dc.contributor.authorKellens, Kristof
dc.contributor.imecauthorVeloso, Anabela
dc.contributor.imecauthorBoccardi, Guillaume
dc.contributor.imecauthorRagnarsson, Lars-Ake
dc.contributor.imecauthorSimoen, Eddy
dc.contributor.imecauthorRoussel, Philippe
dc.contributor.imecauthorSchram, Tom
dc.contributor.imecauthorDekkers, Harold
dc.contributor.imecauthorVan Ammel, Annemie
dc.contributor.imecauthorWitters, Thomas
dc.contributor.imecauthorBrus, Stephan
dc.contributor.imecauthorDangol, Anish
dc.contributor.imecauthorParaschiv, Vasile
dc.contributor.imecauthorVecchio, Emma
dc.contributor.imecauthorSebaai, Farid
dc.contributor.imecauthorKellens, Kristof
dc.contributor.imecauthorHeylen, Nancy
dc.contributor.imecauthorDevriendt, Katia
dc.contributor.imecauthorRichard, Olivier
dc.contributor.imecauthorBender, Hugo
dc.contributor.imecauthorChiarella, Thomas
dc.contributor.orcidimecBoccardi, Guillaume::0000-0003-3226-4572
dc.contributor.orcidimecRagnarsson, Lars-Ake::0000-0003-1057-8140
dc.contributor.orcidimecSimoen, Eddy::0000-0002-5218-4046
dc.contributor.orcidimecRoussel, Philippe::0000-0002-0402-8225
dc.contributor.orcidimecSchram, Tom::0000-0003-1533-7055
dc.contributor.orcidimecDekkers, Harold::0000-0003-4778-5709
dc.contributor.orcidimecDevriendt, Katia::0000-0002-0662-7926
dc.contributor.orcidimecRichard, Olivier::0000-0002-3994-8021
dc.contributor.orcidimecChiarella, Thomas::0000-0002-6155-9030
dc.contributor.orcidimecHoriguchi, Naoto::0000-0001-5490-0416
dc.date.accessioned2021-10-21T13:55:54Z
dc.date.available2021-10-21T13:55:54Z
dc.date.issued2013
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/23314
dc.identifier.urlhttp://ieeexplore.ieee.org/xpl/articleDetails.jsp?tp=&arnumber=6576649&queryText%3DHighly+scalable+Effective+Work+Function+engin
dc.source.beginpageT194
dc.source.conferenceSymposium on VLSI Technology
dc.source.conferencedate11/06/2013
dc.source.conferencelocationKyoto Japan
dc.source.endpageT195
dc.title

Highly scalable effective work function engineering approach for multi-VT modulation of planar and FinFET-based RMG high-k last devies for (sub-)22nm nodes

dc.typeProceedings paper
dspace.entity.typePublication
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