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Ultralow-resistivity CMOS contact scheme with pre-contact amorphization plus Ti (germano-)silicidation
Publication:
Ultralow-resistivity CMOS contact scheme with pre-contact amorphization plus Ti (germano-)silicidation
Date
2016
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Yu, Hao
;
Schaekers, Marc
;
Hikavyy, Andriy
;
Rosseel, Erik
;
Peter, Antony
;
Hollar, K.
;
Khaja, Fareen
;
Aderhold, W.
;
Date, Lucien
;
Mayur, A.J.
;
Lee, J.G.
;
Shin, Keo Myoung
;
Douhard, Bastien
;
Chew, Soon Aik
;
Demuynck, Steven
;
Kubicek, Stefan
;
Kim, Daeyong
;
Mocuta, Anda
;
Barla, Kathy
;
Horiguchi, Naoto
;
Collaert, Nadine
;
Thean, Aaron
;
De Meyer, Kristin
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1
since deposited on 2021-10-23
Acq. date: 2025-10-23
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1988
since deposited on 2021-10-23
Acq. date: 2025-10-23
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Downloads
1
since deposited on 2021-10-23
Acq. date: 2025-10-23
Views
1988
since deposited on 2021-10-23
Acq. date: 2025-10-23
Citations