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Ultralow-resistivity CMOS contact scheme with pre-contact amorphization plus Ti (germano-)silicidation

Date

2016
Proceedings Paper
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dc.contributor.authorYu, Hao
dc.contributor.authorSchaekers, Marc
dc.contributor.authorHikavyy, Andriy
dc.contributor.authorRosseel, Erik
dc.contributor.authorPeter, Antony
dc.contributor.authorHollar, K.
dc.contributor.authorKhaja, Fareen
dc.contributor.authorAderhold, W.
dc.contributor.authorDate, Lucien
dc.contributor.authorMayur, A.J.
dc.contributor.authorLee, J.G.
dc.contributor.authorShin, Keo Myoung
dc.contributor.authorDouhard, Bastien
dc.contributor.authorChew, Soon Aik
dc.contributor.authorDemuynck, Steven
dc.contributor.authorKubicek, Stefan
dc.contributor.authorKim, Daeyong
dc.contributor.authorMocuta, Anda
dc.contributor.authorBarla, Kathy
dc.contributor.authorHoriguchi, Naoto
dc.contributor.imecauthorYu, Hao
dc.contributor.imecauthorSchaekers, Marc
dc.contributor.imecauthorHikavyy, Andriy
dc.contributor.imecauthorRosseel, Erik
dc.contributor.imecauthorPeter, Antony
dc.contributor.imecauthorDate, Lucien
dc.contributor.imecauthorDouhard, Bastien
dc.contributor.imecauthorDemuynck, Steven
dc.contributor.imecauthorKubicek, Stefan
dc.contributor.imecauthorBarla, Kathy
dc.contributor.imecauthorHoriguchi, Naoto
dc.contributor.imecauthorCollaert, Nadine
dc.contributor.imecauthorThean, Aaron
dc.contributor.imecauthorDe Meyer, Kristin
dc.contributor.orcidimecYu, Hao::0000-0002-1976-0259
dc.contributor.orcidimecSchaekers, Marc::0000-0002-1496-7816
dc.contributor.orcidimecHikavyy, Andriy::0000-0002-8201-075X
dc.contributor.orcidimecHoriguchi, Naoto::0000-0001-5490-0416
dc.contributor.orcidimecCollaert, Nadine::0000-0002-8062-3165
dc.date.accessioned2021-10-23T17:38:15Z
dc.date.available2021-10-23T17:38:15Z
dc.date.embargo9999-12-31
dc.date.issued2016
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/27640
dc.identifier.urlhttp://ieeexplore.ieee.org/xpl/articleDetails.jsp?tp=&arnumber=7573381
dc.source.beginpage66
dc.source.conferenceIEEE Symposium on VLSI Technology
dc.source.conferencedate13/06/2016
dc.source.conferencelocationHonolulu, HI USA
dc.source.endpage67
dc.title

Ultralow-resistivity CMOS contact scheme with pre-contact amorphization plus Ti (germano-)silicidation

dc.typeProceedings paper
dspace.entity.typePublication
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