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Introducing novel metal gate materials for decananometer CMOS in the agile fab: a case study

Date

2004
Proceedings Paper
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dc.contributor.authorDeweerd, Wim
dc.contributor.authorSchram, Tom
dc.contributor.authorCatana, Gabriela
dc.contributor.authorShamiryan, Denis
dc.contributor.authorGaraud, Sylvain
dc.contributor.authorHellin, David
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorHeyns, Marc
dc.contributor.authorWickramanayaka, S.
dc.contributor.authorKawashima, T.
dc.contributor.authorYamada, N.
dc.contributor.authorVertommen, Johan
dc.contributor.authorLander, Rob
dc.contributor.imecauthorSchram, Tom
dc.contributor.imecauthorHellin, David
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.accessioned2021-10-15T13:14:26Z
dc.date.available2021-10-15T13:14:26Z
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/8844
dc.source.beginpage53
dc.source.conferenceProceedings of the International Symposium on Semiconductor Manufacturing - ISSM
dc.source.conferencedate27/09/2004
dc.source.conferencelocationTokyo Japan
dc.source.endpage56
dc.title

Introducing novel metal gate materials for decananometer CMOS in the agile fab: a case study

dc.typeProceedings paper
dspace.entity.typePublication
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