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Nanobeam diffraction strain analysis of released Ge gate-all-around nano-wires: challenges and limitations

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dc.contributor.authorFavia, Paola
dc.contributor.authorWitters, Liesbeth
dc.contributor.authorCapogreco, Elena
dc.contributor.authorVancoille, Eric
dc.contributor.authorBender, Hugo
dc.contributor.imecauthorFavia, Paola
dc.contributor.imecauthorWitters, Liesbeth
dc.contributor.imecauthorCapogreco, Elena
dc.contributor.imecauthorVancoille, Eric
dc.contributor.imecauthorBender, Hugo
dc.contributor.orcidimecFavia, Paola::0000-0002-1019-3497
dc.date.accessioned2021-10-25T18:35:46Z
dc.date.available2021-10-25T18:35:46Z
dc.date.issued2018
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/30698
dc.identifier.urlhttp://abstracts.imc19.com/pdf/abstract_203.pdf
dc.source.conference19th International Microscopy Congress - IMC19
dc.source.conferencedate9/09/2018
dc.source.conferencelocationSydney Australia
dc.title

Nanobeam diffraction strain analysis of released Ge gate-all-around nano-wires: challenges and limitations

dc.typeMeeting abstract
dspace.entity.typePublication
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