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The etchback approach: enlarged process window for MuGFET gate etching
Publication:
The etchback approach: enlarged process window for MuGFET gate etching
Date
2005
Presentation
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Degroote, Bart
;
Collaert, Nadine
;
Rooyackers, Rita
;
Baklanov, Mikhaïl
;
Boullart, Werner
;
Kunnen, Eddy
;
Jurczak, Gosia
;
Vanhaelemeersch, Serge
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1917
since deposited on 2021-10-16
Acq. date: 2025-10-23
Citations
Metrics
Views
1917
since deposited on 2021-10-16
Acq. date: 2025-10-23
Citations