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The etchback approach: enlarged process window for MuGFET gate etching

Date

2005
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dc.contributor.authorDegroote, Bart
dc.contributor.authorCollaert, Nadine
dc.contributor.authorRooyackers, Rita
dc.contributor.authorBaklanov, Mikhaïl
dc.contributor.authorBoullart, Werner
dc.contributor.authorKunnen, Eddy
dc.contributor.authorJurczak, Gosia
dc.contributor.authorVanhaelemeersch, Serge
dc.contributor.imecauthorCollaert, Nadine
dc.contributor.imecauthorBoullart, Werner
dc.contributor.imecauthorJurczak, Gosia
dc.contributor.imecauthorVanhaelemeersch, Serge
dc.contributor.orcidimecCollaert, Nadine::0000-0002-8062-3165
dc.contributor.orcidimecBoullart, Werner::0000-0001-7614-2097
dc.contributor.orcidimecVanhaelemeersch, Serge::0000-0003-2102-7395
dc.date.accessioned2021-10-16T01:17:35Z
dc.date.available2021-10-16T01:17:35Z
dc.date.issued2005
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/10360
dc.source.conferenceAVS 6th International Conference on Microelectronics and Interfaces
dc.source.conferencedate21/03/2005
dc.source.conferencelocationSanta Clara, CA USA
dc.title

The etchback approach: enlarged process window for MuGFET gate etching

dc.typeOral presentation
dspace.entity.typePublication
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