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Soft X-ray reflectometry for the inspection of interlayer roughness in stacked thin film structures

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dc.contributor.authorCiesielski, Richard
dc.contributor.authorLoo, Roger
dc.contributor.authorShimura, Yosuke
dc.contributor.authorBogdanowicz, Janusz
dc.contributor.authorMani, Antonio
dc.contributor.authorMitterbauer, Christoph
dc.contributor.authorTruong, Vinh-Binh
dc.contributor.authorKolbe, Michael
dc.contributor.authorSoltwisch, Victor
dc.contributor.imecauthorLoo, Roger
dc.contributor.imecauthorShimura, Yosuke
dc.contributor.imecauthorBogdanowicz, Janusz
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.contributor.orcidimecShimura, Yosuke::0000-0002-1944-9970
dc.contributor.orcidimecBogdanowicz, Janusz::0000-0002-7503-8922
dc.date.accessioned2024-08-26T09:04:46Z
dc.date.available2024-06-15T17:25:27Z
dc.date.available2024-08-26T09:04:46Z
dc.date.embargo2024-04-09
dc.date.issued2024
dc.description.wosFundingTextThe project is supported by Chips Joint Undertaking under grant agreement 101096772 -14ACMOS and grand agreement 875999 -IT2 and its members, including the top-up funding of Belgium, the Netherlands and Romania. We wish to thank Qais Saadeh and Gavin Phillips for valuable discussions.
dc.identifier.doi10.1117/12.3009953
dc.identifier.eisbn978-1-5106-7217-8
dc.identifier.isbn978-1-5106-7216-1
dc.identifier.issn0277-786X
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/44039
dc.publisherSPIE-INT SOC OPTICAL ENGINEERING
dc.source.beginpageArt. 1295507
dc.source.conferenceConference on Metrology, Inspection, and Process Control XXXVIII
dc.source.conferencedateFEB 26-29, 2024
dc.source.conferencelocationSan Jose
dc.source.journalProceedings of SPIE
dc.source.numberofpages4
dc.source.volume12955
dc.title

Soft X-ray reflectometry for the inspection of interlayer roughness in stacked thin film structures

dc.typeProceedings paper
dspace.entity.typePublication
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