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Nanometer scale characterisation of CoSi2 and NiSi induced strain in silicon by convergent beam electron diffraction

Date

2004
Journal article
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dc.contributor.authorBenedetti, Alessandro
dc.contributor.authorBender, Hugo
dc.contributor.authorTorregiani, Cristina
dc.contributor.authorVan Dal, Mark
dc.contributor.authorMaex, Karen
dc.contributor.imecauthorBender, Hugo
dc.contributor.imecauthorVan Dal, Mark
dc.contributor.imecauthorMaex, Karen
dc.date.accessioned2021-10-15T12:42:21Z
dc.date.available2021-10-15T12:42:21Z
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/8562
dc.source.beginpage61
dc.source.endpage66
dc.source.journalMaterials Science and Engineering B
dc.source.volume114-115
dc.title

Nanometer scale characterisation of CoSi2 and NiSi induced strain in silicon by convergent beam electron diffraction

dc.typeJournal article
dspace.entity.typePublication
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