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Effects of different processing conditions on line edge roughness for 193-nm and 157-nm resists
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Effects of different processing conditions on line edge roughness for 193-nm and 157-nm resists
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Date
2004
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Ercken, Monique
;
Leunissen, Peter
;
Pollentier, Ivan
;
Patsis, G.
;
Constantoudis, V.
;
Gogolides, Evangelos
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1914
since deposited on 2021-10-15
1
last month
Acq. date: 2025-12-11
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Metrics
Views
1914
since deposited on 2021-10-15
1
last month
Acq. date: 2025-12-11
Citations