Publication:
Effects of different processing conditions on line edge roughness for 193-nm and 157-nm resists
Date
| dc.contributor.author | Ercken, Monique | |
| dc.contributor.author | Leunissen, Peter | |
| dc.contributor.author | Pollentier, Ivan | |
| dc.contributor.author | Patsis, G. | |
| dc.contributor.author | Constantoudis, V. | |
| dc.contributor.author | Gogolides, Evangelos | |
| dc.contributor.imecauthor | Ercken, Monique | |
| dc.contributor.imecauthor | Pollentier, Ivan | |
| dc.contributor.orcidimec | Pollentier, Ivan::0000-0002-4266-6500 | |
| dc.date.accessioned | 2021-10-15T13:21:54Z | |
| dc.date.available | 2021-10-15T13:21:54Z | |
| dc.date.issued | 2004 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/8888 | |
| dc.source.beginpage | 266 | |
| dc.source.conference | Metrology, Inspection, and Process Control for Microlithography XVIII | |
| dc.source.conferencedate | 22/02/2004 | |
| dc.source.conferencelocation | Santa Clara (CA) USA | |
| dc.source.endpage | 275 | |
| dc.title | Effects of different processing conditions on line edge roughness for 193-nm and 157-nm resists | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
| Files | ||
| Publication available in collections: |