Publication:

Influence of dielectric materials and via geometry on the thermomechanical behavior of silicon through interconnects

Date

 
dc.contributor.authorGonzalez, Mario
dc.contributor.authorLabie, Riet
dc.contributor.authorVandevelde, Bart
dc.contributor.authorBeyne, Eric
dc.contributor.imecauthorGonzalez, Mario
dc.contributor.imecauthorLabie, Riet
dc.contributor.imecauthorVandevelde, Bart
dc.contributor.imecauthorBeyne, Eric
dc.contributor.orcidimecLabie, Riet::0000-0002-1401-1291
dc.contributor.orcidimecVandevelde, Bart::0000-0002-6753-6438
dc.contributor.orcidimecBeyne, Eric::0000-0002-3096-050X
dc.date.accessioned2021-10-16T01:45:09Z
dc.date.available2021-10-16T01:45:09Z
dc.date.issued2005
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/10504
dc.source.beginpage9
dc.source.conference10th Annual SMTA Pan Pacific Microelectronics Symposium & Exhibition
dc.source.conferencedate25/01/2005
dc.source.conferencelocationKauai, HI USA
dc.source.endpage14
dc.title

Influence of dielectric materials and via geometry on the thermomechanical behavior of silicon through interconnects

dc.typeProceedings paper
dspace.entity.typePublication
Files
Publication available in collections: