Publication:

Electrical linewidth metrology for sub-65-nm applications

Date

2004
Proceedings Paper
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dc.contributor.authorStorms, Greet
dc.contributor.authorCheng, Shaunee
dc.contributor.authorPollentier, Ivan
dc.contributor.imecauthorPollentier, Ivan
dc.contributor.orcidimecPollentier, Ivan::0000-0002-4266-6500
dc.date.accessioned2021-10-15T16:28:32Z
dc.date.available2021-10-15T16:28:32Z
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/9644
dc.source.beginpage614
dc.source.conferenceMetrology, Inspection, and Process Control for Microlithography XVIII
dc.source.conferencedate22/02/2004
dc.source.conferencelocationSanta Clara, CA USA
dc.source.endpage622
dc.title

Electrical linewidth metrology for sub-65-nm applications

dc.typeProceedings paper
dspace.entity.typePublication
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