Publication:

Wet etching of TiN in 1-D and 2-D confined nano-spaces of FinFET transistors

Date

2017
Proceedings Paper
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dc.contributor.authorVereecke, Guy
dc.contributor.authorDe Coster, Hanne
dc.contributor.authorCarolan, Patrick
dc.contributor.authorBender, Hugo
dc.contributor.authorWillems, Kherim
dc.contributor.authorRagnarsson, Lars-Ake
dc.contributor.authorVan Dorpe, Pol
dc.contributor.authorHoriguchi, Naoto
dc.contributor.authorHolsteyns, Frank
dc.contributor.imecauthorVereecke, Guy
dc.contributor.imecauthorDe Coster, Hanne
dc.contributor.imecauthorCarolan, Patrick
dc.contributor.imecauthorBender, Hugo
dc.contributor.imecauthorWillems, Kherim
dc.contributor.imecauthorRagnarsson, Lars-Ake
dc.contributor.imecauthorVan Dorpe, Pol
dc.contributor.imecauthorHoriguchi, Naoto
dc.contributor.imecauthorHolsteyns, Frank
dc.contributor.orcidimecVereecke, Guy::0000-0001-9058-9338
dc.contributor.orcidimecDe Coster, Hanne::0000-0002-5968-7703
dc.contributor.orcidimecCarolan, Patrick::0000-0001-5931-3093
dc.contributor.orcidimecWillems, Kherim::0000-0003-1341-1581
dc.contributor.orcidimecRagnarsson, Lars-Ake::0000-0003-1057-8140
dc.contributor.orcidimecVan Dorpe, Pol::0000-0003-0918-1664
dc.contributor.orcidimecHoriguchi, Naoto::0000-0001-5490-0416
dc.date.accessioned2021-10-24T17:41:33Z
dc.date.available2021-10-24T17:41:33Z
dc.date.embargo9999-12-31
dc.date.issued2017
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/29825
dc.identifier.urlhttps://spcc2017.com/wp-content/uploads/2017/03/02-06-Vereecke-imec-Wet_etching_of_TiN_in_FinFET.pdf
dc.source.beginpage199
dc.source.conferenceSurface Preparation and Cleaning Conference - SPCC
dc.source.conferencedate27/03/2017
dc.source.conferencelocationAustin, TX USA
dc.source.endpage209
dc.title

Wet etching of TiN in 1-D and 2-D confined nano-spaces of FinFET transistors

dc.typeProceedings paper
dspace.entity.typePublication
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