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The imec iN7 EUV platform: M2-Block and Via patterning developments

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dc.contributor.authorBekaert, Joost
dc.contributor.authorFranke, Joern-Holger
dc.contributor.authorMao, Ming
dc.contributor.authorLariviere, Stephane
dc.contributor.authorDecoster, Stefan
dc.contributor.authorDi Lorenzo, Paolo
dc.contributor.authorKutrzeba Kotowska, Bogumila
dc.contributor.authorBlanco, Victor
dc.contributor.authorHendrickx, Eric
dc.contributor.authorGallagher, Emily
dc.contributor.authorLeray, Philippe
dc.contributor.authorKim, Ryan Ryoung han
dc.contributor.authorMcIntyre, Greg
dc.contributor.authorColsters, Paul
dc.contributor.authorWittebrood, Friso
dc.contributor.authorvan Dijk, Joep
dc.contributor.authorTimoshkov, Vadim
dc.contributor.authorKiers, Ton
dc.contributor.authorMaslow, Mark
dc.contributor.imecauthorBekaert, Joost
dc.contributor.imecauthorFranke, Joern-Holger
dc.contributor.imecauthorMao, Ming
dc.contributor.imecauthorLariviere, Stephane
dc.contributor.imecauthorDecoster, Stefan
dc.contributor.imecauthorKutrzeba Kotowska, Bogumila
dc.contributor.imecauthorBlanco, Victor
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.imecauthorGallagher, Emily
dc.contributor.imecauthorLeray, Philippe
dc.contributor.imecauthorKim, Ryan Ryoung han
dc.contributor.orcidimecBekaert, Joost::0000-0003-3075-3479
dc.contributor.orcidimecFranke, Joern-Holger::0000-0002-3571-1633
dc.contributor.orcidimecDecoster, Stefan::0000-0003-1162-9288
dc.contributor.orcidimecGallagher, Emily::0000-0002-2927-8298
dc.date.accessioned2021-10-23T10:06:33Z
dc.date.available2021-10-23T10:06:33Z
dc.date.issued2016
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/26330
dc.identifier.urlhttp://euvl2016.org/pdf/EUVL2016_Oral_and_Poster.pdf?161007
dc.source.conferenceInternational Symposium on Extreme Ultraviolet Lithography - EUVL
dc.source.conferencedate24/10/2016
dc.source.conferencelocationHiroshima Japan
dc.title

The imec iN7 EUV platform: M2-Block and Via patterning developments

dc.typeProceedings paper
dspace.entity.typePublication
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