Publication:

EUV single patterning validation of curvilinear routing

Date

 
dc.contributor.authorTreska, Fergo
dc.contributor.authorXu, Dongbo
dc.contributor.authorGillijns, Werner
dc.contributor.authorSherazi, Yasser
dc.contributor.imecauthorTreska, Fergo
dc.contributor.imecauthorXu, Dongbo
dc.contributor.imecauthorGillijns, Werner
dc.contributor.imecauthorSherazi, Yasser
dc.contributor.orcidimecTreska, Fergo::0000-0002-0171-5847
dc.contributor.orcidimecXu, Dongbo::0000-0003-1159-2315
dc.contributor.orcidimecGillijns, Werner::0000-0002-2430-7360
dc.contributor.orcidimecSherazi, Yasser::0000-0002-4076-8597
dc.date.accessioned2025-02-12T09:17:20Z
dc.date.available2023-11-29T21:34:12Z
dc.date.available2025-02-12T09:17:20Z
dc.date.embargo2023-12-31
dc.date.issued2023-04-28
dc.identifier.doi10.1117/12.2654633
dc.identifier.issn0277-786X
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/43200
dc.source.beginpageArt. 124940I
dc.source.conferenceSPIE Advanced Lithography + Patterning 2023
dc.source.conferencedate1 March 2023
dc.source.conferencelocationSan Jose, CA, USA
dc.source.endpageN/A
dc.source.journalProceedings of SPIE; Vol.12494
dc.source.numberofpages14
dc.subject.disciplineMultidisciplinary sciences
dc.subject.keywordsEUV
dc.subject.keywordsSingle Patterning
dc.subject.keywordsCurvilinear
dc.subject.keywordsILT
dc.subject.keywordsMBMW
dc.subject.keywordsVLSI design
dc.title

EUV single patterning validation of curvilinear routing

dc.typeProceedings paper
dspace.entity.typePublication
Files

Original bundle

Name:
124940I.pdf
Size:
1.71 MB
Format:
Adobe Portable Document Format
Description:
Published version
Publication available in collections: