Publication:

Imaging of H2 bubbles and the related strain field in silicon wafers exposed to RF hydrogen plasma

Date

2004
Proceedings Paper
Simple item page Full metadata Statistics
 
dc.contributor.authorGhica, C.
dc.contributor.authorNistor, L.
dc.contributor.authorRichard, Olivier
dc.contributor.authorBender, Hugo
dc.contributor.authorUlyashin, Aliaksandr
dc.contributor.authorVan Tendeloo, G.
dc.contributor.imecauthorRichard, Olivier
dc.contributor.imecauthorBender, Hugo
dc.contributor.orcidimecRichard, Olivier::0000-0002-3994-8021
dc.date.accessioned2021-10-15T13:35:10Z
dc.date.available2021-10-15T13:35:10Z
dc.date.embargo9999-12-31
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/8960
dc.source.beginpage395
dc.source.conferenceProceedings of the 13th European Microscopy Congress. Volume 2: Materials Sciences
dc.source.conferencedate22/08/2004
dc.source.conferencelocationAntwerpen Belgium
dc.source.endpage396
dc.title

Imaging of H2 bubbles and the related strain field in silicon wafers exposed to RF hydrogen plasma

dc.typeProceedings paper
dspace.entity.typePublication
Files

Original bundle

Name:
9156.pdf
Size:
604.87 KB
Format:
Adobe Portable Document Format
Download
Publication available in collections:
Conference contributions