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Properties of silicon layers deposited from supersonic streams activated by electron-beam plasma

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dc.contributor.authorSemenova, O.
dc.contributor.authorSvitasheva, S.
dc.contributor.authorSharafutdinov, R.
dc.contributor.authorKhmel, S.
dc.contributor.authorTschukin, V.
dc.contributor.authorPoortmans, Jef
dc.contributor.authorBilyalov, Renat
dc.contributor.imecauthorPoortmans, Jef
dc.contributor.orcidimecPoortmans, Jef::0000-0003-2077-2545
dc.date.accessioned2021-10-14T23:08:23Z
dc.date.available2021-10-14T23:08:23Z
dc.date.issued2002
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/6818
dc.source.beginpage154
dc.source.conferenceSeminar on Silicon Crystal and Film Growth and Lattice Defects - SILICON 2002
dc.source.conferencedate9/07/2002
dc.source.conferencelocationNovosibirsk Russia
dc.title

Properties of silicon layers deposited from supersonic streams activated by electron-beam plasma

dc.typeProceedings paper
dspace.entity.typePublication
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