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XPS and TOFSIMS studies of shallow Si/Si1-xGex/Si layers

Date

1999
Journal article
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dc.contributor.authorConard, Thierry
dc.contributor.authorDe Witte, Hilde
dc.contributor.authorLoo, Roger
dc.contributor.authorVerheyden, P.
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorCaymax, Matty
dc.contributor.authorGijbels, Renaat
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorLoo, Roger
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.imecauthorCaymax, Matty
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.date.accessioned2021-10-06T10:49:39Z
dc.date.available2021-10-06T10:49:39Z
dc.date.issued1999
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/3311
dc.source.beginpage583
dc.source.endpage586
dc.source.journalThin Solid Films
dc.source.volume343-344
dc.title

XPS and TOFSIMS studies of shallow Si/Si1-xGex/Si layers

dc.typeJournal article
dspace.entity.typePublication
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