Publication:

Defect mitigation solution for area-selective ALD of Ru on TiN/SiO2 nanopatterns

Date

2019
Presentation
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dc.contributor.authorSoethoudt, Job
dc.contributor.authorGrillo, Fabio
dc.contributor.authorMarques, Esteban
dc.contributor.authorVan Ommen, Ruud
dc.contributor.authorBriggs, Basoene
dc.contributor.authorHody, Hubert
dc.contributor.authorSpampinato, Valentina
dc.contributor.authorFranquet, Alexis
dc.contributor.authorChan, BT
dc.contributor.authorDelabie, Annelies
dc.contributor.imecauthorSoethoudt, Job
dc.contributor.imecauthorMarques, Esteban
dc.contributor.imecauthorBriggs, Basoene
dc.contributor.imecauthorHody, Hubert
dc.contributor.imecauthorSpampinato, Valentina
dc.contributor.imecauthorFranquet, Alexis
dc.contributor.imecauthorChan, BT
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.orcidimecSpampinato, Valentina::0000-0003-3225-6740
dc.contributor.orcidimecFranquet, Alexis::0000-0002-7371-8852
dc.contributor.orcidimecChan, BT::0000-0003-2890-0388
dc.date.accessioned2021-10-27T18:43:24Z
dc.date.available2021-10-27T18:43:24Z
dc.date.issued2019
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/34040
dc.source.conferenceALD 2019
dc.source.conferencedate21/07/2019
dc.source.conferencelocationBellevue USA
dc.title

Defect mitigation solution for area-selective ALD of Ru on TiN/SiO2 nanopatterns

dc.typeOral presentation
dspace.entity.typePublication
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