Publication:

Scaled-down deposited underlayers for EUV lithography

Date

2023
Proceedings Paper
https://doi.org/10.1117/12.2660376
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dc.contributor.authorGupta, Mihir
dc.contributor.authorAfonso, Joao Antunes
dc.contributor.authorBezard, Philippe
dc.contributor.authorVallat, Remi
dc.contributor.authorFallica, Roberto
dc.contributor.authorSuh, Hyo Seon
dc.contributor.authorHalder, Sandip
dc.contributor.authorDe Simone, Danilo
dc.contributor.authorLiu, Zecheng
dc.contributor.authorRan, Fanyong
dc.contributor.authorFukuda, Hideaki
dc.contributor.authorSun, Yiting
dc.contributor.authorDe Roest, David
dc.contributor.authorPiumi, Daniele
dc.contributor.imecauthorGupta, Mihir
dc.contributor.imecauthorBezard, Philippe
dc.contributor.imecauthorVallat, Remi
dc.contributor.imecauthorFallica, Roberto
dc.contributor.imecauthorSuh, Hyo Seon
dc.contributor.imecauthorHalder, Sandip
dc.contributor.imecauthorDe Simone, Danilo
dc.contributor.orcidimecGupta, Mihir::0000-0003-0286-7997
dc.contributor.orcidimecFallica, Roberto::0000-0003-4523-9624
dc.contributor.orcidimecHalder, Sandip::0000-0002-6314-2685
dc.contributor.orcidimecDe Simone, Danilo::0000-0003-3927-5207
dc.contributor.orcidimecBezard, Philippe::0000-0003-2499-0240
dc.contributor.orcidimecVallat, Remi::0000-0003-0922-2446
dc.contributor.orcidimecSuh, Hyo Seon::0000-0003-4370-5062
dc.date.accessioned2024-03-07T15:13:32Z
dc.date.available2023-07-28T17:39:36Z
dc.date.available2024-03-07T15:13:32Z
dc.date.issued2023
dc.identifier.doi10.1117/12.2660376
dc.identifier.eisbn978-1-5106-6104-2
dc.identifier.isbn978-1-5106-6103-5
dc.identifier.issn0277-786X
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/42223
dc.publisherSPIE-INT SOC OPTICAL ENGINEERING
dc.source.beginpageArt. 124980R
dc.source.conferenceConference on Advances in Patterning Materials and Processes XL
dc.source.conferencedateFEB 27-MAR 01, 2023
dc.source.conferencelocationSan Jose
dc.source.journalProceedings of SPIE
dc.source.numberofpages6
dc.source.volume12498
dc.title

Scaled-down deposited underlayers for EUV lithography

dc.typeProceedings paper
dspace.entity.typePublication
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