Publication:

Surface modification of porous low-k dielectrics

Date

2003
Proceedings Paper
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dc.contributor.authorLe, Quoc Toan
dc.contributor.authorStruyf, Herbert
dc.contributor.authorBrongersma, Sywert
dc.contributor.authorConard, Thierry
dc.contributor.authorBoullart, Werner
dc.contributor.authorVanhaelemeersch, Serge
dc.contributor.authorMaex, Karen
dc.contributor.imecauthorLe, Quoc Toan
dc.contributor.imecauthorStruyf, Herbert
dc.contributor.imecauthorBrongersma, Sywert
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorBoullart, Werner
dc.contributor.imecauthorVanhaelemeersch, Serge
dc.contributor.imecauthorMaex, Karen
dc.contributor.orcidimecLe, Quoc Toan::0000-0002-0206-6279
dc.contributor.orcidimecBrongersma, Sywert::0000-0002-1755-3897
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecBoullart, Werner::0000-0001-7614-2097
dc.contributor.orcidimecVanhaelemeersch, Serge::0000-0003-2102-7395
dc.date.accessioned2021-10-15T05:20:29Z
dc.date.available2021-10-15T05:20:29Z
dc.date.issued2003
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/7788
dc.source.beginpage206
dc.source.conferenceThin Film Materials, Processes and Reliability
dc.source.conferencedate29/04/2003
dc.source.conferencelocationParis France
dc.source.endpage215
dc.title

Surface modification of porous low-k dielectrics

dc.typeProceedings paper
dspace.entity.typePublication
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