Publication:

New process for controlled formation of ultra-thin PtSi films for infra-red detector applications

Date

1995
Proceedings Paper
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dc.contributor.authorTorres Jacome, Alfonso
dc.contributor.authorKolodinski, Sabine
dc.contributor.authorAlves Donaton, Ricardo
dc.contributor.authorMaex, Karen
dc.contributor.authorRoussel, Philippe
dc.contributor.authorBender, Hugo
dc.contributor.imecauthorMaex, Karen
dc.contributor.imecauthorRoussel, Philippe
dc.contributor.imecauthorBender, Hugo
dc.date.accessioned2021-09-29T13:17:51Z
dc.date.available2021-09-29T13:17:51Z
dc.date.embargo9999-12-31
dc.date.issued1995
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/913
dc.source.beginpage185
dc.source.conferenceGrowth and Characterization of Materials for Infrared Detectors II
dc.source.conferencedate13/07/1995
dc.source.conferencelocationSan Diego, CA USA
dc.source.endpage190
dc.title

New process for controlled formation of ultra-thin PtSi films for infra-red detector applications

dc.typeProceedings paper
dspace.entity.typePublication
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