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HfO2 atomic layer deposition using HfCl4/H2O: the first reaction cycle
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HfO2 atomic layer deposition using HfCl4/H2O: the first reaction cycle
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Date
2008
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Nyns, Laura
;
Delabie, Annelies
;
Caymax, Matty
;
Heyns, Marc
;
Van Elshocht, Sven
;
Vinckier, Chris
;
De Gendt, Stefan
Journal
Journal of the Electrochemical Society
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1825
since deposited on 2021-10-17
2
last month
Acq. date: 2025-12-15
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Metrics
Views
1825
since deposited on 2021-10-17
2
last month
Acq. date: 2025-12-15
Citations