Publication:

HfO2 atomic layer deposition using HfCl4/H2O: the first reaction cycle

Date

2008
Journal article
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dc.contributor.authorNyns, Laura
dc.contributor.authorDelabie, Annelies
dc.contributor.authorCaymax, Matty
dc.contributor.authorHeyns, Marc
dc.contributor.authorVan Elshocht, Sven
dc.contributor.authorVinckier, Chris
dc.contributor.authorDe Gendt, Stefan
dc.contributor.imecauthorNyns, Laura
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorHeyns, Marc
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.orcidimecNyns, Laura::0000-0001-8220-870X
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.accessioned2021-10-17T09:22:07Z
dc.date.available2021-10-17T09:22:07Z
dc.date.issued2008
dc.identifier.issn0013-4651
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14229
dc.identifier.urlhttp://www.ecsdl.org/JES/
dc.source.beginpageG269
dc.source.endpageG273
dc.source.issue12
dc.source.journalJournal of the Electrochemical Society
dc.source.volume155
dc.title

HfO2 atomic layer deposition using HfCl4/H2O: the first reaction cycle

dc.typeJournal article
dspace.entity.typePublication
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